摘要
With the rapid development of indium tin oxide(ITO)in the electronic display industry,choosing which raw powders to prepare high-quality ITO targets has always been a controversial topic.In the work,in order to clearly understand the effect of the raw powders on the microstructure and properties of ITO targets and thin films,tin-doped indium oxide(dITO)and In_(2)O_3-SnO_(2)mixed(mITO)powders were chosen to prepare ITO targets for depositing the films and a comparative study on their microstructure and properties was conducted.It is found that,(1)dITO targets possess a higher solid solubility of tin in indium oxide and more uniform elemental distribution,while there are a higher density,a finer grain size and a higher mass ratio of In_(2)O_3 to SnO_(2)for the mITO targets;(2)dITO films with more coarser columnar grains and a rougher surface prefer to grow along the[100]direction in an Ar atmosphere;(3)the conductive property of ITO films only depends on the doping amount of tin and is independent of the raw powders and the preparation process of the target source;(4)dITO films possess the superior optical property and narrower optical band gap;(5)the etching property of mITO films is superior to that of dITO films due to the lower solid solubility of tin in indium oxide.
基金
financially supported by the National Key R&D Program of China(No.2017YFB0305401)
the National Natural Science Foundation of China(Nos.51874369 and 51871249)
the Huxiang Young Talents Plan(No.2018RS3007)。
