摘要
基于对单片衬底曝光场分布规律的研究,建立了曝光场分布优化的数学模型,推导出计算单片衬底曝光场数目及曝光场顶点坐标值的解析表达式;根据曝光场顶点与衬底中心点之间的关系,开发了优化衬底曝光场分布的算法;将该算法应用于实际曝光加工过程,结果表明:曝光场数量减少了近10%,提高了光刻机的生产效率。
Based on the research on exposure field layout of single substrate,the mathematical model for exposure field layout optimization is built,and the analytical expression for calculating the number of the exposure fields on a single substrate and the expression for calculating the coordinates of the exposure field vertices are derived.According to the geometric relationship between the exposure field vertex and the center point of the substrate,an algorithm for optimizing the exposure field distribution of substrates is developed.The algorithm is applied to the actual exposure production process.It is shown that the quantity of exposure field is reduced by 10%,which improves the production efficiency of lithography machine.
作者
潘春荣
刘云祥
谢斌晖
陈铭欣
PAN Chunrong;LIU Yunxiang;XIE Binhui;CHEN Mingxin(School of Mechanical and Electrical Engineering,Jiangxi University of Science and Technology,Ganzhou 341000,China;Fujian Jingan Photoelectric Co Ltd,Quanzhou 362000,China)
出处
《传感器与微系统》
CSCD
北大核心
2021年第1期56-59,共4页
Transducer and Microsystem Technologies
基金
国家自然科学基金资助项目(51665018)。
关键词
图形化蓝宝石衬底
光刻工艺优化
生产效率
patterned sapphire substrate
lithography process optimization
production efficiency
