摘要
原子光刻光栅的研制存在光栅上纳米周期结构覆盖面积小和纳米条纹高度不一致的问题,限制了原子光刻光栅的应用。本文介绍通过椭圆光斑激光汇聚铬原子沉积大面积一维光栅的技术,将纳米周期结构的覆盖范围扩大到1.5mm×1.5mm,同时,沉积条纹高度的一致性得到有效改善。用椭圆光斑驻波场进行原子光刻研究对实验装置调整的精细度和对准提出了更高的要求。并分析了影响大范围原子沉积的几个关键因素。
The development of atomic lithography has the challenges in the small coverage area of nano-periodic structures,and the inconsistency in the height of nanostripes,which limits the application of atomic lithography gratings.This paper introduces a laser-focused chromium atomic deposition grating with an elliptical spot laser beam to expand the coverage of nano-periodic structures to 1.5mm×1.5mm.Meanwhile,the consistency of the height of the deposition stripes is effectively improved.Therefore,atomic lithography studies with the implementation of the elliptical spot standing wave field put forward higher requirements on the precision and alignment of the experiment instrument adjustment.Several key factors affecting large-scale deposition are discussed.
作者
殷聪
张彤
王建波
钱进
石春英
YIN Cong;ZHANG Tong;WANG Jianbo;QIAN Jin;SHI Chunying(National Institute of Metrology,Beijing 100029,China;Beijing University of Technology,Beijing 100022,China)
出处
《计量技术》
2020年第5期31-35,共5页
Measurement Technique
基金
中国计量科学研究院基本科研业务费项目(AKY1501)。
关键词
原子光刻
纳米间距
光栅
大面积
椭圆光斑
atom lithography
nanometer pitch
grating
large area
elliptical spot
