摘要
建立了一种基于Cr原子光刻技术的nm光栅间距比对测量定值方法。以国家自溯源光栅标准物质来建立标准样板校准溯源体系的可行性为基础,保障测量仪器更高精度、可溯源性;设计并制备了节距长度有序递增的多周期电子束直写光栅样板,满足可适配于不同分辨率的nm测量仪器的需求,名义节距值分别为200、400、600、800、1 000 nm。经国家自溯源光栅标准物质比对后的AFM完成对nm栅格标准样板的测量与表征,实验表明:电子束直写制备的光栅标准样板均匀性水平1 nm,相对不确定度低于2%,光栅均具有良好的均匀性、准确性以及稳定性,验证了研制的光栅标准样板能作为一种理想的实物标准运用于nm几何量量值溯源体系。
A method of nanometer grating spacing comparison measurement based on Cr atomic lithography technology is established.Based on the feasibility of establishing a calibration traceability system for standard templates based on national self-traceable grating reference materials,it ensures higher precision and traceability of measuring instruments.Precision nanometer measuring instruments that can be adapted to different resolutions,sequentially increasing multi-period electron beam direct writing grating template was designed and fabricated,the nominal pitch values are 200,400,600,800,1000 nm.After the national self-traceable grating reference material comparison,AFM completed the measurement and characterization of the nano-grid standard sample.The experiment shows that the uniformity level of the grating standard sample prepared by electron beam direct writing is less than 1 nm,and the uncertainty is less than 2%.The gratings have good uniformity,accuracy and stability,which verifies that the developed grating standard template can be used as an ideal physical standard in the traceability system of nano-geometric quantities.A method of nanometer grating spacing comparison measurement based on Cr atomic lithography technology is established.Based on the feasibility of establishing a calibration traceability system for standard templates based on national self-traceable grating reference materials,it ensures higher precision and traceability of measuring instruments(AFM,SEM,etc.);In order to meet the needs of high-precision nanometer measuring instruments that can be adapted to different resolutions,sequentially increasing multi-period electron beam direct writing grating template was designed and fabricated,the nominal pitch values are 200 nm,400 nm,600 nm,800 nm,1000 nm.After the national self-traceable grating reference material comparison,AFM completed the measurement and characterization of the nano-grid standard sample.The experiment shows that the uniformity level of the grating standard sample prepared by e
作者
陈凯晴
管钰晴
邹文哲
邓晓
孔明
陈雅晴
熊英凡
傅云霞
雷李华
CHEN Kai-qing;GUAN Yu-qing;ZOU Wen-zhe;DENG Xiao;KONG Ming;CHEN Ya-qing;XIONG Ying-fan;FU Yun-xia;LEI Li-hua(College of Metrology&Measurement Engineering,China Jiliang University,Hangzhou,Zhejiang 310018,China;Shanghai Institute of Measurement and Testing Technology,Shanghai 201203,China;School of Physical Science and Engineering,Tongji University,Shanghai 200092;Shanghai Key Laboratory of Online Test and Control Technology,Shanghai 201203,China)
出处
《计量学报》
CSCD
北大核心
2023年第5期671-678,共8页
Acta Metrologica Sinica
基金
上海市优秀学术/技术带头人计划(21XD1425000)。
