摘要
采用氢气为辅助气体,在不同氢气流速下用微波等离子体辅助脉冲直流磁控溅射系统制备碳化硼薄膜。碳化硼薄膜的设计厚度为1200 nm,过渡层非晶硅的设计厚度为500 nm。所用的基板为载玻片、Ge、Si、Si wafer、GaAs和JGS3。之后,采用傅里叶红外光谱(FT-IR),X射线衍射(XRD)、维氏硬度计(Vicker indenter),分析了氢气流速(0、3、7和10 mL/min)对碳化硼薄膜的光学性质和机械性质的影响。结果表明,氢气流速的增加,可以明显提高红外光学透过率,降低红外光光吸收率。与此同时,氢气的增加还能降低薄膜应力,使薄膜易于附着在基底上。然而,氢气也会使得碳化硼薄膜硬度降低。
In this study,boron carbide thin films were deposited by microwave plasma-assisted pulsed DC sputtering system with hydrogen as reactive gas at different hydrogen flow rates.The design thickness of boron carbide thin film was 1200 nm,and the design thickness of transition layer amorphous Si was 500 nm.The substrates used were microslides,Ge,Si,Si wafer,GaAs and JGS3.Then,Fourier infrared spectroscopy(FT-IR),X-ray diffraction(XRD)and Vicker indenter were used to analyze the effects of hydrogen flow(0,3,7 and 10 mL/min)on the optical and mechanical properties of boron carbide thin films.As the results,the infrared optical transmittance and absorption rate could be improved by increasing the flow rate of hydrogen.At the same time,the increase of hydrogen could also reduce the stress of the coating,making it easy to adhere to the substrate.However,hydrogen reduced the hardness of boron carbide thin films.
作者
陈儒婷
SHIGENG SONG
DES GIBSON
LEWIS FLEMING
SAM AHMADZADEH
HIN ON CHU
XIAOLING ZHANG
CHEN Ruting;SONG Shigeng;GIBSON Des;FLEMING Lewis;AHMADZADEH Sam;CHU Hinon;ZHANG Xiaoling(School of Optoelectronic Engineering, Xi’an Technological University, Xi’an 710061, China;School of Computing, Engineering and Physical Sciences, University of the West of Scotland,Paisley PA12BE, UK;Teer Coatings Ltd., West Stone House, West Stone, Berry Hill Industrial Estate, Droitwich,Worcestershire WR9 9AS, UK)
出处
《功能材料》
EI
CAS
CSCD
北大核心
2020年第7期7039-7044,共6页
Journal of Functional Materials
关键词
碳化硼薄膜
红外性质
机械性质
boron carbide thin films
infrared optical properties
mechanical properties
