期刊文献+

MoS_x FILMS DEPOSITED ON DIFFERENT MATRIXES BY ION BEAM TECHNIQUE

MoS_x FILMS DEPOSITED ON DIFFERENT MATRIXES BY ION BEAM TECHNIQUE
下载PDF
导出
摘要 MoSx (x = 1.79  ̄ 2.34) films of 200 nm thickness are deposited onto brass and C20 steel substrates by the ion beam assisted technique, respectively. Structures and compositions of these films, and changes in valence states of the Mo element are examined by XRD and XPS before and after wear. The lubrication properties and wear resistances for two kinds of samples are evaluated using a pin-on-disk installation in atmosphere at the room temperature. Tribo-wear behaviours and the microstructures between two kinds of samples exhibit obvious differences.
出处 《Nuclear Science and Techniques》 SCIE CAS CSCD 1995年第3期178-182,共5页 核技术(英文)
关键词 Molybdenum disulphide Ion beam assisted deposition FRICTION WEAR MoSx薄膜 淀积 离子束
  • 相关文献

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部