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THGEM探测器化学抛光及其工作气体优化

Chemical Polishing of THGEM Detector and Optimization of Its Working Gas
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摘要 采用新的化学抛光方法处理HGEM膜,在不同的气体成分和比例下对THGEM膜的增益和能量分辨进行研究测量.结果表明,以Ar/C4H10为工作气体的THGEM探测器所需工作电压较低、增益高、能量分辨相对较好.在Ar/C4H10(95%/5%)的气体条件下,THGEM的增益可达7×10^3. THGEM films were treated by a new chemical polishing method in this experiment. The gain and energy resolution of THGEM films were measured under different gas composition and proportion. The optimal gas selection scheme (Ar/C4H10) is obtained. Under this gas, for THGEM, by using relatively low work voltage, high gain and relatively high energy resolution could be obtained. The experimental result indicated that the highest gain is 7×10^3when the detector work in Ar/C4H10(95%/5%).
作者 谢文锦 赵子喻 覃潇平 刘熙文 黄雪峰 黄博 封焕波 刘倩 刘宏邦 XIE Wen-jin;ZHAO Zi-yu;QIN Xiao-ping;LIU Xi-wen;HUANG Xue-feng;HUANG Bo;FENG Huan-bo;UU Qian;LIU Hong-bang(Guangxi University,Nanning 530004,China;Zhejiang University,Hangzhou 310027,China;University of Chinese Academy of Sciences,Beijing 100049,China)
出处 《核电子学与探测技术》 CAS 北大核心 2019年第3期297-300,共4页 Nuclear Electronics & Detection Technology
基金 国家自然科学基金(U1731239) 广西自然科学基金(2018GXNSFGA281007) 广西高等学校高水平创新团队及卓越学者计划资助
关键词 THGEM膜 气体成分 优化 增益 能量分辨 THGEM film gas composition optimization gain energy resolution
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参考文献3

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