摘要
简述了正性光刻胶的光聚合机理,重点阐述了我国正性光刻胶的制备研究进展,并指出了我国正性光刻胶研究及发展方向。
In this paper, the mechanism of photopolymerization of positive photoresist is briefly described. Then the progress in the preparation of positive photoresist in China is emphasized, and the future research direction and development direction of the positive photoresist in China are also pointed out.
作者
杜新胜
张红星
DU Xin-shen;ZHANG Hong-xing(Research Institute of Lanzhou Petrochemical Company,Petrochina,Lanzhou,Gansu 730060,Chin;Polypropylene plant of Ethylene plant,Lanzhou Petrochemical Company,Lanzhou,Gansu 730060,Chin)
出处
《粘接》
CAS
2019年第1期36-40,共5页
Adhesion
关键词
正性
光刻胶
光聚合机理
聚合
应用
positive
photoresist
photo polymerization mechanism
polymerization
application
