摘要
用X射线光电子能谱 (XPS)对自制ZrO2 薄膜进行了成分分析 .结果发现 ,在基片有负偏压的条件下 ,薄膜发生了氧缺位现象 ,退火处理可以补偿氧缺位 .在膜表面存在一个Y的偏聚层 .
The composition of the self-made ZrO 2 thin film has been analyzed by XPS(X-ray photoelectron spectroscopy). The results show that when there is negative bias on substrate, the oxygen imperfection would be produced, but it can be compensated by annealing. There is a Y richment layer in the surface layer of the ZrO 2 film. The reasons of these phenomena have also been discussed.
出处
《郑州工业大学学报》
CAS
2000年第4期39-41,共3页
Journal of Zhengzhou University of Technology
基金
湖南省自然科学基金资助项目!(97J0 2 7)
关键词
氧化锆薄膜
X射线光电子能谱
成分
ZrO 2 thin film
X-ray photoelectron spectroscopy
composit8
