摘要
评价了离子镀氮化钛(TiN)和Y改性氮化钛(Ti(Y)N)膜的结合强度和在酸性介质中的耐蚀性能;用X射线衍射,离子探针质谱分析(IMA),透射电子显微镜(TEM)研究它们的显微结构特征;结果表明,添加Y元素富集在Ti(Y)N与A_3钢基材界面区域,并形成厚度约为20nm的亚层,Y的界面改性导致Ti(Y)N膜的X射线衍射线形略有宽化和明显的TiN相(111)面的择优生长取向;这些显微结构特征的改善导致Ti(Y)N膜比TiN膜具有更高的界面结合强度和更好的耐蚀性能。
The microstructure and properties of ion plated titanium nitride film can be improved by adding rare earth element yttrium. Y-modified titanium nitride (Ti(Y)N) film exhibits an excellent corrosion resistance and binding strength to the substrate of A3 steel. The microstructure characteristics of Ti(Y)N/A3 system have been investigated by X-ray diffraction, ion probe mass analysis and cross section transmission electron microscopy. The results show that yttrium is enriched at the interface of Ti(Y)N/A3 system and the modification of Y at the interface leads to a very good metallurgical transition band from the substrate to the film and the preferential orientation along close-packed TiN(lll) crystal plane, which may be the major reasons for the improvement of the properties of the Ti(Y)N film.
出处
《物理学报》
SCIE
EI
CAS
CSCD
北大核心
1991年第9期1520-1524,T001,共6页
Acta Physica Sinica
