摘要
建立了非晶态化学镀NiP原子沉积过程计算机模拟模型 ,用MonteCarlo方法对原子沉积过程进行了二维 (2D)计算机模拟。结果表明 ,吸附原子的迁移概率及最大迁移距离S对镀层的显微孔隙有显著的影响。随着吸附原子迁移概率的增加 (k减小 )及最大迁移距离S的增大 ,吸附原子有更大的概率迁移到配位数较多的位置处沉积 ,即原子填充空穴及孔隙的机会多 ,镀层孔隙率低。
Two dimensional computer simulation model in atomic scale using Monte Carlo method was established. The researches have remarkable scientific value and engineering significance for controlling coating's structure and microporosity. Two dimensional computer simulation structure of the coating was given and the influence factors of microporosity were revealed. The simulation results showed that migration probability of adatoms ( k ) and migration distance ( S ) influenced the microporosity, the microporosity decreased with the decrease of k and with the increase of S .
出处
《机械工程材料》
CAS
CSCD
北大核心
2002年第10期15-18,共4页
Materials For Mechanical Engineering
