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不同腐蚀时间对CZT(211)B衬底的影响分析 被引量:3

Analysis of etching time influence on CZT(211)B substrate
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摘要 主要分析了不同溴甲醇(溴体积比为0. 05%)腐蚀时间对CZT(211) B衬底表面粗糙度、总厚度偏差、红外透过率、Zn值以及X射线衍射半峰宽(FWHM)的影响。研究发现即使使用溴体积比0. 05%的溴甲醇溶液腐蚀5 s,衬底表面粗糙度都会由0. 5 nm增加至1. 5 nm以上。随着腐蚀时间的增加CZT(211) B衬底总厚度偏差逐渐增加。使用溴甲醇作为抛光液的两个样品的Zn值明显低于使用氨水作为抛光液的样品,同时该两样品的X射线衍射半峰宽和红外透过率随腐蚀时间的变化趋势一致,但不同于使用氨水作为抛光液的样品,说明不同的抛光液影响CZT(211) B衬底表面Zn值以及表面损伤层等表面状态。 The influenee of etching time (bromonlethanol, bromine volume ratio of 0. 05% ) on the surface roughness, total thickness variation,infrared transmittance, Zn value and half width at half maxima of X raydiffraction (FWHM) of CZT (211) B substrate were analyzed,in the paper. It was found that the surface roughness of the substrate increased from 0. 5 nm to 1.5 nm even if the bromine methanol solution, which bromine volume ratio is 0. 05%, was used for 5 seconds. With the increase of etching time, the total thickness deviation (TTV) of CZT (211 ) B substrate gradually increases. The Zn value of two samples using bromomethanol as the polishing solution was significantly lower than that using ammonia as the polishing solution. Meanwhile, the FWHM and infrared transmittance of the two sam- pies were consistent with variation trend of etching time, but different from that using ammonia as the polishing solu- tion. It is indicated that different polishing solution affect the surface state of CZT (211 ) B substrate, such as Zn value and surface damage layer.
作者 吴亮亮 王经纬 高达 王丛 刘铭 周立庆 WU Liang-liang;WANG Jing-wei;GAO Da;WANG Cong;LIU Ming;ZHOU Li-qing(North China Research Institute of Electro-Optics,Beijing 100015,China)
出处 《激光与红外》 CAS CSCD 北大核心 2018年第10期1268-1273,共6页 Laser & Infrared
关键词 碲锌镉 澳甲醇 表面粗糙度 总厚度偏差 CdZnTe bromomethanol surface roughness TTV
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