摘要
采用直流磁控溅射法在聚2,6-萘乙酸乙二醇酯(PEN)柔性薄膜衬底上制备了纯钛薄膜。研究了溅射气压与溅射功率对薄膜微观组织及硬度的影响,确定了最佳的溅射工艺参数。研究表明,直流磁控溅射法在PEN柔性衬底上沉积的钛膜是一种纳米薄膜且为多晶薄膜;在溅射气压为8.5×10^(-1) Pa、溅射功率为140 W时,直流磁控溅射法制备的钛镀层晶粒尺寸细小且均匀分布在衬底上,镀层硬度高,复合振膜宏观表面平整,结合力良好,此工艺参数为最佳的工艺参数,薄膜沉积速率为2.11nm/s。
The Ti thin film has been prepared on the flexible poly（ethylene glycol）2,6-naphthalate（PEN）thin film substrate by DC magnetron sputtering method.The effects of sputtering pressure and sputtering power on the microstructure and hardness of the films were investigated,and the optimum sputtering parameter was determined.Study shows that Ti film deposited on PEN flexible substrate by DC magnetron sputtering is a kind of nanometer film and polycrystalline film.When the sputtering pressure is 8.5×10-1 Pa and the sputtering power is 140 W,the grains size coating of Ti were small and evenly distributed on the substrate,and the hardness of coatings is high.The coating can be obtained with high adhesion strength,good appearance under this parameter.Thus,this parameter is the optimum sputtering parameter,from which the deposition rate achieved was2.11 nm/s.
作者
丁雨田
陈建军
高钰璧
许佳玉
孟斌
马元俊
DING Yutian,CHEN Jianjun,GAO Yubi,XU Jiayu,MENG Bin,MA Yuanjun(State Key Laboratory of Advanced Processing and Recycling of Nonferrous Metals, Lanzhou University of Technology, Lanzhou 730050, Chin)
出处
《功能材料》
EI
CAS
CSCD
北大核心
2018年第5期5169-5173,5179,共6页
Journal of Functional Materials
关键词
复合振膜
弹性模量
磁控溅射
工艺参数
composite diaphragm
elastic modulus
magnetron sputtering
optimum sputtering parameter
