摘要
采用钛铝合金比为7∶3的靶,通过非平衡磁控溅射离子镀制备TiAlN涂层。采用X射线衍射仪、扫描电子显微镜和MFT-4000多功能材料表面性能试验机对膜层形貌成分、组织结构及硬度进行测试分析,分析溅射功率对TiAlN涂层组织和结构的影响。测试结果表明:随着溅射功率的减小,膜层晶粒结构变得更稀疏,结合力减弱,Al/Ti比值变小。
TiAlN coatings are fabricated by unbalanced magnetron sputtering ion plating by using target which is composed of titanium aluminum alloy ratio 7∶3. The micro structure and hardness of TiAlN coating are analyzed by X-ray diffractometer,scanning electron microscope and MFT-4000 multifunctional material surface testing machine. The influence of sputtering power on the structure and microstructure of TiAlN coating is analyzed. The results show that with the decrease of the sputtering power,the grain structure of the film becomes more sparse,binding force is weakened,Al/Ti ratio decreases.
作者
左伟峰
赵广彬
程玺儒
Zuo Weifeng;Zhao Guangbin;Cheng Xiru
出处
《工具技术》
2018年第4期76-78,共3页
Tool Engineering
基金
"高档数控机床与基础制造装备"科技部重大专项(2009zx04012-23)
四川省特种材料及制备技术重点实验室项目