摘要
分析了磁流变化学抛光的加工机理,对蓝宝石基片的磁流变化学抛光进行了试验研究。结果表明:磁流变化学抛光可将蓝宝石基片加工到亚纳米级粗糙度的超光滑镜面,材料去除率受化学反应速率和剪切去除作用共同影响,化学反应速率越快,剪切去除作用越强,材料去除率越高;混有硅胶溶液与α-Al2O3磨料的磁流变化学抛光液去除率最高;材料去除率随工作间隙,励磁间隙以及加工时间的增大而减少,随铁粉浓度减少而减少;利用磁流变化学抛光方法加工蓝宝石基片可获得Ra 0.3 nm的超光滑表面。
Machining mechanism of magnetorheological chemical polishing is analyzed. Polishing experiments are conducted for sapphire substrate. The results show that magnetorheological chemical polishing sapphire substrate can be processed to sub-nanometer roughness ultra smooth mirror, the material removal rate is affected by the chemical reaction rate and shear action to remove the chemical reaction rate is faster, the stronger the shear removed, material removal rate is higher;higher removal rate is obtained when the magnetorheological chemical fluid which contains colloidal silica and α-Al2O3 abrasive is used as polishing slurry. The material removal rate decreases with the increase in work gap, excitation gap and polishing time, but with the decrease in particle concentrations. Ultra-smooth surface of 0.3 nm in Ra is achieved by using magnetorheological chemical polishing.
出处
《机械工程学报》
EI
CAS
CSCD
北大核心
2016年第5期80-87,共8页
Journal of Mechanical Engineering
基金
国家自然科学基金(51205120)
国际科技合作与交流专项(2014DFG72480)
大连理工大学精密与特种加工教育部重点实验室开放基金资助项目
关键词
蓝宝石基片
磁流变化学抛光
材料去除率
超光滑镜面
sapphire substrate
magnetorheological chemical polishing
material removal rate
ultra-smooth mirror surface
