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Morphological and Microstructural Evolution and Related Impurity Incorporation in Non-Polar a-Plane GaN Grown on r-Sapphire Substrates

Morphological and Microstructural Evolution and Related Impurity Incorporation in Non-Polar a-Plane GaN Grown on r-Sapphire Substrates
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摘要 Effects of the growth temperature on morphological and microstructural evolution of a-plane GaN films grown on r-plane sapphires by metal organic chemical vapor deposition are investigated by atomic force microscopy and secondary ion mass spectroscopy (SIMS). Surface morphology, structural quality and related impurity incorpora- tion are very sensitive to the growth temperature. A significant difference of yellow luminescence is observed and attributed to the incorporation of carbon into GaN films, which is confirmed by SIMS analysis. Our results show that the sample with triangular-pit morphology has sample with pentagon-like pit morphology, which is significantly higher concentrations of oxygen than the other induced by the existence of an N-face in triangular pits. Effects of the growth temperature on morphological and microstructural evolution of a-plane GaN films grown on r-plane sapphires by metal organic chemical vapor deposition are investigated by atomic force microscopy and secondary ion mass spectroscopy (SIMS). Surface morphology, structural quality and related impurity incorpora- tion are very sensitive to the growth temperature. A significant difference of yellow luminescence is observed and attributed to the incorporation of carbon into GaN films, which is confirmed by SIMS analysis. Our results show that the sample with triangular-pit morphology has sample with pentagon-like pit morphology, which is significantly higher concentrations of oxygen than the other induced by the existence of an N-face in triangular pits.
出处 《Chinese Physics Letters》 SCIE CAS CSCD 2015年第9期154-157,共4页 中国物理快报(英文版)
基金 Supported by the National Natural Science Foundation of China under Grant No 61204006 the Fundamental Research Funds for the Central Universities under Grant No K50511250002
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  • 1Nakanmra S, Senoh M, Iwasa N, Nagahanla S, Yamada T and Mukai T 1995 ,lpn. J. Appl. Phys. 34 1332. 被引量:1
  • 2Chen D Y, Wang L, Xiong C B, Zheng C D, Mo C L and Jiang F Y 2013 Chin. Phys. Lett. 30 098101. 被引量:1
  • 3Pengelly R S, Wood S M, Milligan ,l W, Sheppard S T and Pribble W L 2012 IEEE ans. Microw. Th.eor. Technol. 60 1764. 被引量:1
  • 4Miller D A B, Chemla D S, Damen T C, Gossard A C, Wiegmann W, Wood T H and Burrus C A 1984 Phys. Rev. Lett. 53 2173. 被引量:1
  • 5Sheu J K, Chang S J, Kuo C H, Wu L W, Lin Y C, Lai W C, Tsai J M, Chi G C and Wu R K 2003 IEEE Photon. Technol. Lett. 15 18. 被引量:1
  • 6Hwang S M, Seo Y G, Baik K H, Ch I So, Baek J H, Jung S K, Kim T G and Cho M W 2009 Appl. Phys. Lett. 95 071101. 被引量:1
  • 7Chakraborty A, Haskell B A, Keller S, Speck J S, DenBaars S P, Nakamura S and Mishr U K 2004 Appl. Phys. Lett. 85 5143. 被引量:1
  • 8Ding L Z, Chen H, He M, Jiang Y, Lu T P, Deng Z, Chen F S, Yang F, Yang Q and Zhang Y L 2014 Chin. Phys. Lett. 31 076101. 被引量:1
  • 9Liu C, Xie Z, Han P, Liu B, Li L, Zou J, Zhou S, Bai L H, Zhang C H, Zhang R and Zheng Y D 2007 J. Cryst. Growth 298 228. 被引量:1
  • 10Sun Q, Kwon S Y, Ren Z, Han J, Onuma T, Chichibu F S and Wang S 2008 Appl. Phys. Left. 92 051112. 被引量:1

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