摘要
采用激光脉冲沉积 ( PL D)法在 Si( 10 0 )衬底上生长得到了完全 c轴择优取向的 L i Nb O3( L N)薄膜 ,X射线衍射分析表明 L N( 0 0 6)衍射峰的半峰宽为 0 .3 5°.利用棱镜耦合器 ,激光可以被耦合到 L N薄膜中 ,形成 TE和 TM模式的光波导 .测得 L N薄膜的折射率 n0 为 2 .2 85 ,薄膜的厚度为 0 .199μm.
Fully c-orient LiNbO_3 (LN) films are grown o n Si(100) or SiO_2 substrate by pulse laser deposition (PLD),and the full width at half maximum of the LN (006) diffraction is only 0.35° by X-ray diffracti on.Laser can be coupled into the LN film by prism coupler and the TE or TM mode optical waveguide is formed.By this method,the refractive index n_0 (2.285 ) and thickness (0.199μm) of the film are determined.
基金
国家自然科学基金重大研究规划资助项目 (编号 :90 10 10 0 9)~~
