摘要
简要评述了用脉冲激光沉积技术制备类金刚石膜及金刚石薄膜的研究进展，总结了激光脉冲沉积制备薄膜的基本原理及其特点，分析了激光波长、能量、衬底温度等对薄膜质量的影响。
The development of diamond-like carbon films and diamond films prepared by pulsed laser deposition is reviewed,followed by summarization of mechanism and characteristics of thin films by pulsed laser deposition.The effect of laser wavelength and energy,and substrate temperature,etc.on growth of the films is discussed.
出处
《半导体光电》
EI
CAS
CSCD
北大核心
1998年第4期249-251,255,共4页
Semiconductor Optoelectronics
关键词
脉冲激光沉积
类金刚石薄膜
金刚石薄膜
Pulsed Laser Deposition,Diamond-like Carbon Film,Diamond Film
