摘要
低压下利用四异丙醇钛水解法制备了 Ti O2 薄膜 ,将 Ti O2 固定化并尽可能保留其尺寸效应 .联系制膜条件和膜的表性 ,研究了 Ti O2 薄膜的光催化活性 .利用 Raman、XRD、AFM和 UV-vis等手段探讨了不同膜厚、晶型、衬底对膜催化活性的影响 .结果表明 ,随着衬底温度的升高 ,Ti O2由非晶型转变为锐钛矿 ,光催化活性提高 ;随着 Ti O2 薄膜厚度的增加 ,催化活性降低 .在玻片、Si、Sn O2 、Al为基片所制 Ti O2 薄膜中 ,以 Al为基片的 Ti O2
Using titanium tetraisopropoxide (TTIP) as precursor, a TiO 2 thin film was prepared by low pressure chemical vapour deposition (LPCVD). The titanium dioxide was fixed, and the size effect of the photocatalyst was retained as much as possible. The influence of process condition on the properties of TiO 2 films was studied. The use of LPCVD TiO 2 film for the photocatalytic degradation of an organic compound phenol was investigated. The effect of crystalline structure, thickness, substrates on catalyst activity was also researched.
出处
《上海交通大学学报》
EI
CAS
CSCD
北大核心
2002年第1期1-4,共4页
Journal of Shanghai Jiaotong University
