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电子束背散射在胶层中的能量沉积 被引量:2

Enery Deposition of Backscattering Electrons in PMMA Resist Layer
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摘要 模拟了散射电子在PMMA(聚甲基丙烯酸甲酯 )电子束胶层中的能量沉积分布。在处理电子穿越衬底的边界时 ,采用了几率确定法 ,用以判断电子是否在界面处发生一次弹性散射。 The spatial distribution of the energy deposition of the scattering electrons in PMMA resist is simulated. A new approach that whether or not an elastic scattering event occurs on the boundary is determined by a random number is utilized. The graphs of both forward scattering energy deposition and backscattering energy deposition have been given.
出处 《微细加工技术》 2002年第1期6-9,26,共5页 Microfabrication Technology
关键词 电子束背散射 胶层 能量沉积 E beam energy deposition random probability number scatter
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  • 1干东英,王立鼎.微型机械的现状与发展[J].机械工程学报,1994,30(2):1-8. 被引量:23
  • 2安德祥 尹明.DSD—2多功能电子束扫描系统[J].电子学报,1987,15(3):27-30. 被引量:1
  • 3Eigler D M, Schweizer E K.Positioning single atoms with a scanning tunneling microscope.Nature, 1990,344:524~526 被引量:1
  • 4Yamagate Y, Mihara S, Nishioki N.A new fabrication mettecd for micro actuators with piezoelectric thin film using precision cutting technique. IEEE MEMS, 1996, 48, 307~311 被引量:1
  • 5Fritz,Baller M K. Translating biomolecular recognition into nanomechanics. Science, 2000, 288:316~322 被引量:1
  • 6Dewolf P, Brazel E. Electrical testing application forscanning probe microscopes. Solid state technol. , 2000, 38 (9):117~125 被引量:1
  • 7Wada Y. Possible application of micromachine technology for nanometer lithography. Microelectronics, 1998, 29:601~611 被引量:1
  • 8EIGLER D M, SCHWEIZER E K. Positioning single atoms with a scanning tunneling microscope[J]. Nature, 1990, 344:524-532. 被引量:1
  • 9YAMAGATE Y, MIHARA S, NISHIOKI N. A new fabrication matted for micro actuators with piezoelectric thin film using precision cutting technique[J]. IEEE MEMS, 1996, 48:307-311. 被引量:1
  • 10FRITZ. Translating bimolecular recognition into nanmechanics[J]. Science, 2000, 288:316-322. 被引量:1

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