摘要
隐身技术是当今世界各国重点发展的国防高科技 ,等离子体隐身是一种新型隐身技术。本文介绍了等离子体及其产生 ,讨论了等离子体的隐身原理 。
Stealth technology is the high technology of the national defense focused by countries over the world. Plasma stealth is a new type of stealth technology. The conception and generation of plasma stealth are introduced in this paper.The principle of plasma stealth technology is discussed and the characteristic and application of plasma stealth technology are analyzed .
出处
《雷达与对抗》
2002年第1期17-21,6,共6页
Radar & ECM
