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GaN基材料及其在短波光电器件领域的应用 被引量:2

GaN-based Semiconductor Materials and Its Applications in Short Wavelength Optoelectronic Devices
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摘要 GaN具有禁带宽度大、热导率高、电子饱和漂移速度大、临界击穿电压高和介电常数小等特点 ,在高亮度发光二极管、短波长激光二极管、高性能紫外探测器和高温、高频、大功率半导体器件等领域有着广泛的应用前景。本文介绍了GaN基半导体材料的各种特性、材料生长以及在光电器件领域的应用 。 GaN have the characteristics of wide bandgap, high thermal conductivity, large electron saturation shift velocity and low dielectric constant. They have wide applications in those fields such as high brightness light emitting diodes, short wavelength laser diodes, high performance UV detector, and high temperature, high frequency, large power semiconductor devices. This paper introduces the known characteristics, growth methods, heterostructure and its applications in optoelectronic and microelectronic fields of GaN-based semiconductor materials, followed by our opinions of the remaining difficulties and analysis for further studies.
出处 《高技术通讯》 EI CAS CSCD 2002年第3期104-110,共7页 Chinese High Technology Letters
基金 86 3计划 ( 86 3 715 0 11 0 0 33) 国家自然科学基金 ( 6 9976 0 0 8)资助项目
关键词 GAN 材料性质 外延生长 半导体器件 半导体材料 短波光电器件 氮化镓 GaN, Materials characteristics, Epitaxy growth, Semiconductor devices
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  • 1[1]Strite S, Morkoq H J. Vac Sci Technol, 1992, B 10(4): 1237 被引量:1
  • 2[2]Morkoq H, Strite S, Gao G B, et al. J Appl Phys, 1994, 76(3): 1363 被引量:1
  • 3[3]Johnson W C, Parsons J B, Crew M C J. Phys Chem, 1932, 36: 2561 被引量:1
  • 4[4]Maruska H P, Tietjen J J. Appl Phys Lett, 1969, 15: 327 被引量:1
  • 5[5]Amano H, Akasaki I, Hiramatsu K, et al. Thin Solid Films, 1988, 163: 415 被引量:1
  • 6[6]Nakamura S. Jpn J Appl Phys, 1991, 30: L1705 被引量:1
  • 7[7]Amano H, Kito M, Hiramatsu K, et al. Jpn J Appl Phys, 1989, 28: L2112 被引量:1
  • 8[8]Nakamura S, Mukai T, Senoh M, et al. Jpn J Appl Phys, 1992, 31: L139 被引量:1
  • 9[9]Adesida I, Mahajan A, Andideh E, et al. Appl Phys Lett, 1993, 63: 2777 被引量:1
  • 10[10]Furtado M, Jacob G. J Crys Growth, 1983, 64: 257 被引量:1

同被引文献29

  • 1谢自力,张荣,崔旭高,陶志阔,修向前,刘斌,李弋,傅德颐,张曾,宋黎红,崔影超,韩平,施毅,郑有炓.Mn掺杂GaN基稀磁半导体材料制备和特性研究[J].半导体技术,2008,33(S1):150-153. 被引量:1
  • 2Strite S,Morkoq H J.Vac Sci Technol.1992,B10(4):1237. 被引量:1
  • 3Hidenori Shimawaki an,Hironobu Miyamoto.GaN-based FETs for Microwave High-Power Applications.Gallium Arsenide and Other Semiconductor Application Symposium,2005.EGAAS 2005.European. 被引量:1
  • 4Dietl T,Ohno H,Matsukura F,et al.Zener Model Description of Ferromagnetism in Zinc-Blende Magnetic Semiconductors[J].Science,2000,287(5455):1019-1022. 被引量:1
  • 5Pearton S J,Park Y D,Abernathy C R,et al.Ferromagnetism in GaN and SiC doped with transition metals[J].Thin Solid Films,2004,447-448 ;493-501. 被引量:1
  • 6Dalpian Gustavo M,Wei Su-Huai,Gong X G,et al.Phenomenological band structure model of magnetic coupling in semiconductors.Solid State Commun,2006,138(7):353-358. 被引量:1
  • 7Lee Seung-Cheol,Lee Kwang-Ryeol,and Lee Kyu-Hwan.Electronic structures and valence band splittings of transition metals doped GaNs.J Magn Magn Mater,2007,310(2):e732-e734. 被引量:1
  • 8Flannery L B, Harrison I, Lacklison D E, et al. Fabrication and characterization of p-type GaN metal-semiconductormetal ultraviolet photoconductors grown by MBE[J]. Materials Science and Engineering, 1997, B50: 307. 被引量:1
  • 9Pau J L, Monroy E, Munoz E, et al. AlGaN photodetectors grown on Si(111) by molecular beam epitaxy[J]. Journal of Crystal Growth, 2001,230 : 544. 被引量:1
  • 10Teke A, Dogan S, Yun F, et al. GaN/AlGaN back illuminated multiple-quantum-well Schottky barrier ultraviolet photodetectors[J]. Solid State Electronics, 2003,47: 1 401. 被引量:1

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