摘要
主要介绍了一种结构新颖的光学曝光系统 ,对光路的结构、原理、特点以及关键技术作了详细的论述 。
This paper primarily introduce a sort of structure of novel optical exposure systerm and detailedly discuss the optical structure, principle, character as well as the pivotal technology of optical systerm, and give the chart of optical systerm and the testing result of illumination uniformity
出处
《电子工业专用设备》
2001年第4期7-11,共5页
Equipment for Electronic Products Manufacturing
关键词
i线曝光系统
分步投影
光刻机
Exposure systerm of i-line
Illumination uniformity
Quadrate column fly-eye lens
Reticle blind
Condensing systerm of aberrational crrection.
