摘要
激光诱导半导体的液相腐蚀具有常規半导体腐蚀工艺所无法比拟的某些优点。本文介绍了这种新腐蚀技术的基本原理,主要特点,并举例说明了它的应用。
Laser-induced aqueous etching of semiconductor has many advantages which cannot be duplicated by conventional etch methods In this paper, the basic principle, main character and advantages of this technique are described. Its applications are also presented through some examples.
出处
《激光与红外》
CAS
CSCD
北大核心
1991年第5期43-46,42,共5页
Laser & Infrared
