摘要
镀膜行业的快速发展对溅射靶材的大型化、利用率等提出了更高要求。但传统的靶材制备方法在靶材大型化方面存在很大局限。等离子喷涂技术可喷涂几乎所有的陶瓷、金属、金属化合物,在靶材制备领域有着巨大的应用潜力。本文重点介绍了目前溅射靶材主要制备方法及存在问题,并对等离子喷涂制备溅射靶材的特点及设备现状及发展方向进行了阐述。
The rapid development of coating film industry comes forward higher requirements in large scale,utilization of sputtering target materials. However,there are huge limits in large-scale target materials because of the traditional preparation methods of target. Plasma spraying technology can be applied in all of the ceramic,metal, metal compounds and has great potential applications in the preparation of target areas. The main preparation methods and problems of sputtering target materials were recommended. Additionally,the characteristics of the plasma spraying preparation of sputtering target materials,equipment status and development direction are expounded.
出处
《中国钼业》
2014年第2期43-46,共4页
China Molybdenum Industry
关键词
等离子喷涂
溅射靶材
制备
plasma spraying
sputtering targets
preparation
