摘要
为了制作基于ZnS的对雷达波高效电磁屏蔽的金属网栅,采用了一种新型的先胶后镀的光刻复制工艺。但在制作过程中,发现影响金属网栅成品率的主要因素为ZnS材料的颜色,即由于多晶ZnS的颜色和所用光刻胶的颜色相似,很难判断网栅是否显影彻底,进而影响真空镀膜过程中金属网栅膜的形成。结合金属网栅的制作工艺,通过采用镀一层过渡膜的方式,即采用镀膜、涂胶、显影、腐蚀、镀膜、去胶、腐蚀的工艺,有效地解决了ZnS颜色带来的影响。实验表明,采用该工艺一次性成功制作出线宽为8μm、周期为400μm的金属网栅。该工艺使基于ZnS金属网栅的成品率在90%以上。
In order to fabricate metallic meshes based on ZnS which can shield electromagnetic wave , a new type of photolithography copy technology process is adopted , in which photoresist is coated firstly and then plated in vacuum machine .But the color of polycrystalline ZnS resembles that of photo-resist, it is hard to es-timate the developing degree of meshes during the process of making metallic meshes , which affects the prepa-ration of metallic meshes film in the process of vacuum plating .A new method by plating a transition film is proposed, in which the processes including vacuum coating , spin-coating, developing, etching, vacuum coating, removing, etching are adopted combining the fabrication technology of metallic meshes .The testing results indicate that the metallic meshes with the line width of 8μm and the line period of 400μm are fabrica-ted successfully .With this technology , the yield of metallic meshes is improved up to 90%.
出处
《中国光学》
EI
CAS
2014年第1期131-136,共6页
Chinese Optics
基金
中国科学院长春光学精密机械与物理研究所三期创新资助项目(No.Y00332H100)
关键词
金属网栅
多晶ZnS
光刻复制工艺
光刻胶
metallic mesh
polyclystalline ZnS
photolithography copy technology
photoresist
