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孪生磁控溅射制备氮化铬涂层的研究 被引量:1

Synthesis of CrN Coatings by Symmetrical Bipolar Pulsed Magnetron Sputtering and Its Corrosion Resistance
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摘要 主要研究了孪生磁控溅射技术制备不同含氮量的CrNx涂层,以及N2流量对涂层组织、结构性能、耐腐蚀性能的影响。试验设备采用自行研制的MSP-1000复合离子镀膜机,配置了四对孪生磁控溅射靶和对称双极性脉冲中频磁控溅射电源。结果表明:增加氮流量对膜层的性质有重要的影响。如CrN晶体生长取向,随着N2流量的增加CrN择优取向由<111>转变为<200>,N2流量较低时涂层中生成有Cr2N相。在N2流量为33%和100%时的CrNx腐蚀电位分别为-0117和-0133 V,具有较强的抗盐雾腐蚀性能。 The CrN coatings were deposited by symmetrical bipolar pulsed magnetron sputtering on substrate of the 201 stainless steel. The impacts of the coating conditions, including the nitrogen flow rate,bias voltage, and pressure, on the microstructures and mechanical properties of the CrN coating were evaluated. The CrN coatings were characterized with X-ray diffraction (XRD), scanning electron microscopy, and mechanical probes. The results show that the ratio of Nz and Ar flow rates, strongly affects the microstmctures of the CrN coatings with improved corrosion resistance. For instance, as the ratio increased, the preferential growth orientation turned from 〈 111 〉 into 〈 200 〉 , some of the Cr2N phase changed into the CrN phase. At the ratios of 33 % and 100%, the corrosion potentials were estimated to be - 0.17 V and - 0.33 V. Grown at 33 %, the compact smooth CrN coatings resisted the corrosion of salt spray fairly well for 200 h.
出处 《真空科学与技术学报》 EI CAS CSCD 北大核心 2013年第12期1242-1245,共4页 Chinese Journal of Vacuum Science and Technology
关键词 中频磁控溅射 CRN涂层 耐腐蚀性能 腐蚀电位 X射线衍射 Mid-frequecy maoletron sputtering, CrN films, Corrosion behavior, Corrosion potential, XRD
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