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关于衍射光学元件在量子电子学系统中多领域应用的分析

The Analysis of Applications of the Diffraction Optical Element in the Field of Quantum Electronics System
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摘要 随着现代光电子信息技术及其光学技术的日益先进,衍射光学元件自身的应用优势不断开拓,一系列的新型光学元件不断被应用,衍射光学元件的应用范围是比较广泛的,通过对其各个物理学层次的应用剖析,进行衍射光学元件设计极其应用原理的实例探究. With the development of modem optoelectronic information technology and optical technology, application advantages of the diffraction optical element is continuously expanded, a series of new type of optical element are used continuously, and the application scope of diffraction optical element is relatively wide, through application on diffraction the analysis of the various levels of physics application, principle of the design and optical element are inquired.
作者 王小羊
机构地区 泰州学院
出处 《哈尔滨师范大学自然科学学报》 CAS 2013年第4期28-31,共4页 Natural Science Journal of Harbin Normal University
关键词 衍射光学技术 物理应用 分析 The diffraction optical technology Physical application Analysis
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  • 1佟军民,胡松,李爱敏,谢常青.衍射光学元件在无掩模光刻中的应用[J].微细加工技术,2006(5):18-23. 被引量:4
  • 2赵国峰,侯民贤.汽车前照灯光形检测的嵌入式系统设计[J].光学仪器,2007,29(1):42-46. 被引量:2
  • 3赫尔齐克.微光学元件、系统和应用[M].北京:国防工业出版社,2002. 被引量:5
  • 4朱方文.基于LAP方法的机器人灵巧手控制[D].上海:上海大学,2006:10-14. 被引量:3
  • 5EHRHARDT M, RACIUKAITIS G, GECYS P, et al.. Laser-induced backside wet etching of fluoride and sapphire using picosecond laser pulses[J]. Appl. Phys. A, 2010,101: ZIMMER K,BOHME R, 399-404. 被引量:1
  • 6EHRHARDT M, etal Mechanism of backside etching of transparent mate- rials with nanosecond UV-lasers[J]. Appl. Phys. A, 2010,101: 405-410. 被引量:1
  • 7BOHME R, PISSADAKIS S, EHRHARDT M, et al.. Backside etching of fused silica with ultra-short laser pulses at the interface to absorbing liquid[J]. Journal of Physics : Conference Series, 2007,59 : 173-176. 被引量:1
  • 8HOPP B, VASS C, SMAUSZ T. Laser induced backside dry etching of transparent materials [J]. Applied Surface Science, 2007,253 : 7922-7925. 被引量:1
  • 9ZIMMER K, BCIHME R, VASS C, et al.. Time- resolved measurements during backside dry etching of fused silica[J]. Applied Surface Science, 2009 (25) :9617-9621. 被引量:1
  • 10ZIMMER K,BOHME R, RAUSCHENBACH B. Laser etching of fused silica using an adsorbed tol uene layer[J]. Appl. Phys. A, 2004,7:1883-1885. 被引量:1

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