摘要
概述了国内外掺锑氧化锡(ATO)透明导电薄膜制备技术的研究现状,包括溶胶凝胶法、射频磁控溅射法、喷雾热解法、化学气相沉积法等,对比分析了各种制备方法的优缺点和及其所制备薄膜的性能;介绍了薄膜厚度、锑掺杂浓度、退火工艺参数等对薄膜光学性能的影响,提出了开发具有良好光学性能ATO薄膜需要解决的问题。最后对ATO薄膜今后的发展方向进行了展望。
The current situation of antimony-doped tin oxide （ATO） thin film preparation techniques is outlined, including sol-gel method, radio-frequency magnetron sputtering, spray pyrolysis, chemical vapor deposition and so on. Comparison of advantages and disadvantages of various preparation methods as well as the performance of the films prepared by those methods are analyzed. The influences of process parameters such as the film thickness, doping concentration of Sb and annealing process parameters on the optical properties of film are summarized. Problems to be solved in the development of ATO films with excellent optical properties are elicited. Finally the development of ATO thin film is forecasted.
出处
《机械工程材料》
CAS
CSCD
北大核心
2013年第10期5-9,20,共6页
Materials For Mechanical Engineering
基金
科技部创新基金资助项目(10C26224302621)
关键词
ATO薄膜
制备方法
光学性能
ATO thin film
preparation technique
optical property
