摘要
采用射频磁控溅射方法在玻璃基底上制备氮化铜薄膜,研究了氮氩混合气体中的氮气比例对薄膜择优生长取向、表面晶粒尺寸和微观力学性能的影响。结果表明:低氮气比例时,薄膜的纳米力学性能比较差;随着氮气比例的增加,氮化铜薄膜的择优生长晶面从(111)晶面转变为(100)晶面,晶粒尺寸变小,显微硬度增加,弹性模量则是先增加,后减小。
Copper nitride thin films were prepared on silicon glass substrates by means of RF magnetron sputtering dep- osition, and then the effects of nitrogen partial pressure in a fixed-total Na-Ar mixture sputtering gas flow on the preferential crystalline orientation, the size of surface grain and micro-mechanical properties were investigated. It is showed that when the nitrogen partial pressure is low, the nano-mechanieal property of the thin film is poor. As nitrogen partial pressure improves the preferential orientation transforms from plane （111 ） to plane （100） , the crystalline grain size shrinks and the elastic modulus first increases but then decreases.
出处
《表面技术》
EI
CAS
CSCD
北大核心
2013年第5期15-18,31,共5页
Surface Technology
基金
国家自然科学基金项目(51272033)
关键词
氮化铜薄膜
射频磁控溅射
微结构
纳米力学
copper nitride thin film
r. f. magnetron sputtering
micro structure
nano-mechanical
