摘要
随着光刻技术的发展,电子器件的尺寸越来越小,已经进入纳米量级.几十年来,光学光刻技术在半导体加工图形转移的过程中一直扮演着重要角色,纳米压印技术以产量高、成本低、工艺流程简单的优点逐渐在图形转移技术中崭露头角.介绍了一种新型的激光辅助纳米压印技术,基于有限元方法并借助ANSYS软件对压印过程中二维的熔融层填充过程进行模拟.Si基板在激光作用下形成熔融层时,采用Mooney-Rivlin模型表示熔融层的机械性能.通过试验分析了深宽比、转移图形宽度和占空比对聚合物变形的影响,总结了技术的可行性与优越性,为以后纳米压印过程的优化提供了参数支持.
With the development of photolithography technology,more and more small size of electronic devices has entered the nanometer scale.For decades,optical photolithography technology in semiconductor processing pattern transfer process has played an important role.Due to the shortcoming of photolithography technology,nano-imprint technology with the advantages of high yield,low cost,simple process gradually cut a striking figure in the graphic transfer techniques.In this paper,a new laser-assisted nano-imprint technique is introduced.Based on the finite element method and ANSYS software,filling process of two-dimensional melting layer is simulated in imprinting process.When the metal film is formed under the action of laser molten state,the mechanical performance of the metal molten layer is represented by the Mooney-Rivlin model.Through the experimental analysis of the effects of the aspect ratio,the width of the groove,the duty ratio,the coefficient of friction on the deformation of the polymer,the feasibility and superiority of this technology are summarized.This can provide the support for the optimization of parameters in the imprinting process.
出处
《华北水利水电学院学报》
2013年第4期98-101,共4页
North China Institute of Water Conservancy and Hydroelectric Power
