摘要
采用不对称交流脉冲电位法在镀镍工件表面制备聚8–羟基喹啉薄膜。研究了阶跃电位、阶跃时间、重复次数和溶液中8–羟基喹啉含量等工艺条件对电沉积聚8–羟基喹啉薄膜的影响。分别采用塔菲尔曲线测量、扫描电镜和能谱分析对电沉积后工件的耐蚀性、薄膜的表面形貌和组成进行分析。最佳工艺条件为:8–羟基喹啉0.002mol/L,氢氧化钠0.4mol/L,正阶跃电位0.55V,负阶跃电位0.05V,正阶跃时间0.2s,负阶跃时间0.1s,重复次数100。采用最佳工艺处理后,工件的腐蚀电位、腐蚀速率分别为0.32V和4.1581×103g/(m2·h),耐蚀性优于未处理的工件,且与铬钝化处理的工件相当。
Poly-8-hydroxyquinoline thin films were prepared on nickel-plated workpiece surface by asymmetrical pulse-reverse potentiostatic method. The effects of process conditions such as step potentials, step time, cycle number, and 8-hydroxyquinoline concentration on electrodeposition of poly-8-hydroxyquinoline thin film were studied. The corrosion resistance of workpiece and the surface morphology and composition of thin film were analyzed by Tafel curves measurement, scanning electron microscopy, and energy- disperse spectroscopy, respectively. The optimal process conditions are as follows： 8-hydroxyquinoline 0.002 mol/L, sodium hydroxide 0.4 mol/L, positive step potential 0.55 V, negative step potential -0.5 V, positive step time 0.2 s, negative step time 0.1 s, and cycle number 100. After treating under the optimal process conditions, the corrosion potential and rate of workpiece are -0.32 V and 4.158 1 × 10^-3 g/（m^2.h）, respectively, which is superior to the untreated nickel-plated workpiece and equivalent to the chromate oassivated one.
出处
《电镀与涂饰》
CAS
CSCD
北大核心
2013年第5期1-5,共5页
Electroplating & Finishing
基金
中南大学中央高校基本科研业务费专项资金资助(2012zzts054)
关键词
8-羟基喹啉
聚合
电沉积
不对称交流脉冲电位法
镀镍
耐蚀性
8-hydroxyquinoline
polymerization
electro-deposition
asymmetrical pulse-reverse potentiostatic method
nickel plating
corrosion resistance
