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Hg_(1-x)Cd_xTe/CdTe/Si薄膜厚度测试方法的研究 被引量:4

Study on film thickness measurement of Hg_(1-x)Cd_xTe/CdTe/Si
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摘要 在分子束外延生长高质量的CdTe/Si复合衬底上,分别通过MBE和LPE技术成功地研制出Hg1-xCdxTe/CdTe/Si红外探测器所需的重要红外半导体材料。利用傅里叶变换红外光谱仪对Hg1-xCdxTe/CdTe/Si红外半导体材料的红外透射光谱进行测试分析且计算薄膜厚度,并配合扫描电子显微镜对其厚度计算分析进行校正,最终获得一种无破坏、无污染、快捷方便的多层膜厚度测试方法。 High quality CdTe/Si composite substrate is grown by molecular beam epitaxy. We developHg1-xCdxTe/CdTe/si which is an important infrared material and used for making infrared detector by MBE and LPE respectively. The infrared transmission spectrum of Hg1-xCdxTe/CdTe/sianalyzed and then the film thickness is calcu- lated. The SEM measurement result is used for correcting. Finally, we establish a non-destructive, non-polluted, fast and convenient measurement method for muhilayer film thickness.
出处 《激光与红外》 CAS CSCD 北大核心 2012年第12期1351-1354,共4页 Laser & Infrared
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参考文献9

  • 1De Lyon T J,Rajavel R D,Jensen J E,et al. Heteroepita-xy of HgCdTe ( 112 ) infrared detector structures on Si (112) substrates by molecular-beam epitaxy [ J ]. J Elec- tron Materials, 1996,25 (8) : 1341 - 1346. 被引量:1
  • 2Smith F T, Norton P W, Vecchio P Lo, et al. Te-rich liquid phase epitaxial growth of HgCdTe on Si-based substrates [ J ]. J Electron Materials, 1995,24 (9) : 1287 - 1292. 被引量:1
  • 3Johnson S M, De Lyon T J, Cockrum C A. Direct growth of CdZnTe/Si substrates for large-area HgCdTe infrared focal plane arrays [ J ]. J Electron Materials, 1995,24 ( 5 ) : 467 - 473. 被引量:1
  • 4周立庆,刘铭,巩锋,董瑞清,折伟林,常米.3英寸CdTe/Si复合衬底外延技术研究[J].激光与红外,2011,41(5):537-541. 被引量:20
  • 5杨建荣,何进,沈寿珍,马可军,俞振中.MOCVD-Hg_(1-x)Cd_xTe/CdTe/GaAs外延材料红外吸收光谱研究[J].红外与毫米波学报,1994,13(3):191-198. 被引量:2
  • 6Finkman E, Nenirovsky Y. Infrared optical absorption of Hg, _xCd, Te[ J]. J Appl. Phys. ,1979,50(6) :4356 -4361. 被引量:1
  • 7Kucera Z. Dispersion of the refractive index of Hgl-x Cd, Te [ J ]. Phy s. Status Solidi ( a), 1987, 100 ( 2 ) : 659 - 665. 被引量:1
  • 8Liu K, Chu J H, Li B, et al. Measurement of composition in HgL,Cd, Te epilayers[ J ]. Appl. Phys. Lett. , 1994,64 (21) :2818 -2820. 被引量:1
  • 9褚君浩著..窄禁带半导体物理学[M].北京:科学出版社,2005:934.

二级参考文献17

  • 1周立庆.碲镉汞外延用衬底材料的现状和发展[J].激光与红外,2005,35(11):808-811. 被引量:12
  • 2P S, Wijewarnasuriya, G Brill, et al. LWIR MBE HgCdTe photovoltaic detectors grown on Si composite substrates [ J ]. SPIE,2004,5406:323 - 331. 被引量:1
  • 3W J Everson,C K Ard, et al. Etch pit characterization of CdTe and CdZnTe substrate for use in mercury cadmium telluride epitaxy [ J]. J. Electron. Mater, 1995, 24: 505 - 510. 被引量:1
  • 4J M Peterson, J A Franklin, et al. High-quality large-area MBE HgCdTe/Si [ J ]. Journal Electronic Materials, 2006, 35(6) : 1283 - 1286. 被引量:1
  • 5L A Almeida, L Hirsch, et al. Improved morphology and crystalline quality of MBE CdZnTe/Si [ J ]. Journal Elec- tronic Materials ,2001,30(6) :608 - 610. 被引量:1
  • 6N K Dhar, C E C Wood, et al. Heteroepitaxy of CdTe on (211) Si using crystallized amorphous ZnTe templates [ J ]. J. Vac. sci. Technol, 1996, B14 (3) :2366 - 2372. 被引量:1
  • 7Y Chen, S Farrell, et al. Dislocation reduction in CdTe/Si by molecular beam epitaxy through in - situ annealing [ J]. Journal of Crystal Growth ,2008,310:5303 - 5307. 被引量:1
  • 8M Kawano,A Ajisawa, et al. HgCdTe and CdTe ( - 1 - 13)B growth on Si( 112)5°off by MBE[ J]. Appl. Phy. Lett. , 1996,69 ( 19 ) :2876 - 2879. 被引量:1
  • 9J D Benson,et al. Topography and dislocation in(112) B HgCdTe/CdTe/Si [ J ]. Journal Electronic Materials, 2009,38 ( 8 ) : 1771 - 1775. 被引量:1
  • 10诸君浩,J Appl Phys,1992年,71卷,8期,3955页 被引量:1

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