摘要
采用高分辨率X射线衍射摇摆曲线、光致发光以及霍尔测试对采用气态源分子束外延方法生长的四元系In-AlGaAs材料性质进行了表征。摇摆曲线结果表明,根据计算数据所生长的InAlGaAs样品与InP衬底基本匹配.光致发光和霍尔测试结果显示随着Al组分的增加,样品的光致发光强度、电子浓度和迁移率均有所下降.样品的三族元素组分由光致发光及X射线衍射实验获得,测试结果与设计值吻合,Al组分的实验设计值与测试结果的关系提供了一种实用的精确控制组分的方法.
Properties of quaternary InAlGaAs alloys prepared by gas source MBE growth have been investigated with high resolution X-ray diffraction rocking curves, photoluminescence and Hall measurements. X-ray rocking curves show that all the samples are well matched to InP substrate according to calibration data. The photoluminescence and Hall measurement show that the PL intensity, electron concentration and mobility decrease distinctly as Al composition increases. The group III compositions are determined from both photoluminescence and x-ray diffraction measurements, and agreed well with the designed values. The relationship between the designed Al compositions and measured values provides us a practical way for the precise composition control.
出处
《红外与毫米波学报》
SCIE
EI
CAS
CSCD
北大核心
2012年第5期385-388,398,共5页
Journal of Infrared and Millimeter Waves
基金
Supported by National Basic Research Program of China(2012CB619202)
Founding of Key Laboratory of Infrared Imaging Materials and Detectors,Chinese Academy of Sciences and Innovative Founding of Shanghai Institute of Microsystem and Information Technology,Chinese Academy of Sciences
