摘要
基于等效媒质理论设计了NiCr四层渐变膜系。以4∶1的NiCr合金靶材,氧气和氮气为反应气体,氩气为工作气体,用磁控反应溅射法制备蓝色NiCr系太阳能光谱选择性吸收薄膜。测试分析薄膜成分、微观结构、厚度、吸收比和发射率对薄膜性能的影响。测试结果表明两层吸收膜的吸收比大于单层吸收膜;单层吸收膜的吸收比随填充因子的增大而增大;当单层吸收膜的填充因子在两层吸收膜的填充因子之间时,两层吸收膜的发射率小于单层吸收膜;两层吸收膜的吸收比随减反射层厚度的增大先增大后减小,发射率则一直增大。为多层铜基NiCr系阳光吸收膜磁控溅射沉积制备工艺提供了理论依据。
Here,we addressed the design,deposition,and characterization of the four-layered,NiCr gradient,solar selective absorption coatings.The NiCr multi-layers were grown by reactive magnetron sputtering of nickel-chrome（4：1） alloy target on Cu substrates.The influencing deposition conditions were evaluated.The microstructures and properties of the NiCr coatings were characterized with X-ray diffraction and transmission electron microscopy.The results show that the number of absorption layer strongly affects the properties.For instance,when it comes to the absorption rate,the double absorption-layer film outperforms the single absorption layer film.The absorption rate of the single absorption layer film increased with an increase of the fill factor;at a fill factor lying between those of the double absorption layer film,its emission rate was found to be greater than that of the latter.Besides,as the antireflection layer thickness increased,the absorption rate of the double absorption-layer film varied in an increase-decrease mode,accompanied with a continuous increase of the emission rate.
出处
《真空科学与技术学报》
EI
CAS
CSCD
北大核心
2012年第8期669-673,共5页
Chinese Journal of Vacuum Science and Technology
关键词
磁控反应溅射
吸收比
发射率
溅射工艺
填充因子
Reactive magnetron sputtering
Absorption rate
Emission rate
Sputtering technology
Fill factor
