摘要
利用脉冲激光法制备了ZnO∶Al透明导电膜。通过对膜进行霍尔系数测量及SEM、XRD测试分析 ,详细研究了沉积时的基片温度、氧分压强对膜的透光率和电阻率的影响。结果表明 :基片温度、氧分压强影响着膜的电学、光学性能和膜的结晶状况。从电学分析看出 :基片温度从 2 0 0℃升到 30 0℃过程中 ,膜的载流子浓度、透光率和光隙能相应增大。在氧分压强为0Pa、基片温度为 4 0 0℃下沉积的膜 ,其电阻率具有较低值 ,且在可见光区其透光率约为 90 %。
In this paper,the effects of oxygen pressure and substrate temperature on the resistivity and optical transmittance of ZnO∶Al films by pulsed laser deposition have been investigated.The properties of the films have been analysed through Hall effect and X-ray diffraction.From electrical and optical analysis we observed the carrier concentration,optical transmittance and optical energy gap increased when the deposition temperature is raised from 200℃ to 400℃.The film prepared at 400℃ has a lower resistivity and a transmittance of about 90% in the visible range.
出处
《功能材料》
EI
CAS
CSCD
北大核心
2000年第B05期82-83,共2页
Journal of Functional Materials
关键词
脉冲激光沉积
ZnO膜
基片温度
氧分压强
pulsed laser deposition
zinc oxide films
substrate temperature
oxygen pressure
