摘要
随着超快激光器向高功率、高脉冲能量发展,半导体可饱和吸收反射镜(SESAM)的损伤机制和高阈值SESAM的研究必不可少,本文用热像仪对高功率超快激光器中工作的SESAM进行热成像,得出不同腔型、不同功率超快激光器中工作的SESAM的热成像图。用平均功率约为83W,单脉冲能量约为24μJ,重复频率为3.4MHz的高功率超快激光器发出的激光脉冲作用于SESAM时,观察到了SESAM表面的热损伤,并用干涉测量法对其表面进行面形分析。
With the development of ultrafast laser to high power and high pulse energy,it is necessary to study damage mechanism of semiconductor saturable absorber mirror（SESAM） and high threshold SESAM.Damage mechanism of SESAM in high power ultrafast laser is theoretically analyzed and experimentally observed in this paper.The damage mechanism on surface of SESAM is studied by heat imaging of SESAM in working high power ultrafast laser with thermal imager and the SESAM surface damaged by high power femtosecond laser pulses is also analyzed.Both heat damage of SESAM and the influential factors are studied in this paper.
出处
《长春理工大学学报（自然科学版）》
2011年第4期20-22,26,共4页
Journal of Changchun University of Science and Technology(Natural Science Edition)
