摘要
Growth of GaInAsSb epilayer by liquid phase epitaxy (LPE) was reported. The LPE system with a hor-izontal sliding graphite boat was employed. The Te-doped (100) GaSb wafer was chosen as substrate. Thephysical properties of the GalnAsSb / GaSb heterostructure were investigated by double crystal X-ray rock-ing diffraction and photoluminescence. The p-GaInAsSb/ n-GaSb photodiode was made by using theseheterostructure materials .The detectivity of the photodiode D* is 4.65 ×10￣9 cm . Hz￣(1 /2) W￣(-1).
Growth of GaInAsSb epilayer by liquid phase epitaxy (LPE) was reported. The LPE system with a hor-izontal sliding graphite boat was employed. The Te-doped (100) GaSb wafer was chosen as substrate. Thephysical properties of the GalnAsSb / GaSb heterostructure were investigated by double crystal X-ray rock-ing diffraction and photoluminescence. The p-GaInAsSb/ n-GaSb photodiode was made by using theseheterostructure materials .The detectivity of the photodiode D* is 4.65 ×10￣9 cm . Hz￣(1 /2) W￣(-1).
