摘要
采用紫外-可见透射光谱仪测量了对靶磁控溅射沉积法制备的氢化非晶硅(a-Si:H)薄膜的透射光谱和反射光谱.利用T/(1-R)方法来确定薄膜的吸收系数,进而得到薄膜的消光系数;通过拟合薄膜透射光谱干涉极大值和极小值的包络线来确定薄膜折射率和厚度的初始值,并利用干涉极值公式进一步优化薄膜的厚度值和折射率;利用柯西公式对得到的薄膜折射率进行拟合,给出了a-Si:H薄膜的色散关系曲线.为了验证该方法确定的薄膜厚度和光学常量的可靠性,将理论计算得到的透射光谱与实验数据进行了比较,结果显示两条曲线基本重合,可见这是确定a-Si:H薄膜厚度及光学常量的一种有效方法.
Hydrogenated amorphous silicon（a-Si：H） films were deposited on quartz substrates by reactive facing target sputtering technique.The transmission and reflectance spectra of a-Si：H thin films measured by UV-VIS transmittance measurement were studied.The absorption coefficient α,therefore extinction coefficient κ,were determined by T/（1-R） method.The refractive index n and film average thickness d were determined from the upper and lower envelopes of the transmission spectra,and further modified by the basic equation for interference fringes.The dispersion curve of a-Si：H film fitted by Cauchy dispersion relationship of refractive index was given.In order to illuminate the reliability of the determined parameters,the calculated transmission curve was compared to experimental one,the results show the two curves almost match together.Therefore the method is effective to determine a-Si： H thin film thickness and optical constants.
出处
《光子学报》
EI
CAS
CSCD
北大核心
2011年第7期1096-1100,共5页
Acta Photonica Sinica
基金
国家自然科学基金(No.60940020)资助
关键词
氢化非晶硅
透射谱
薄膜厚度
光学常量
Hydrogenated amorphous silicon
Transmission spectra
Film thickness
Optical constants
