摘要
研究了硅胶对Ge的吸附性能。结果表明,硅胶对Ge的吸附在15 min基本达到静态吸附平衡;高浓度HNO3环境有利于硅胶对Ge的吸附;温度对吸附率的影响不大;Ge质量浓度大于0.65 g/L时,吸附处于饱和状态,有利于吸附均匀性。硅胶吸附Ge的过程符合Langmuir模型和Freundlich模型,是一个吸热过程,动力学过程符合一级动力学方程。
Adsorption characteristics of germanium on silica gel were studied.Results show that the adsorption process can basically achieve the state of adsorption equilibrium within 15 min.The high-concentration HNO3 environment is favorable for the adsorption of Ge on silica gel.The adsorption rate is increasing with the system temperature.The concentration of Ge should be over 0.65 g/L.The adsorption process meets the Langmuir adsorption model and can also satisfy the Freundlich adsorption model.The adsorption process is an endothermic process,and the adsorption of Ge on silica gel can be best described by first order kinetics.
出处
《核化学与放射化学》
CAS
CSCD
北大核心
2011年第1期6-11,共6页
Journal of Nuclear and Radiochemistry
关键词
硅胶
吸附
吸附等温式
吸附热力学
吸附动力学
silica gel
adsorption
adsorption isotherm
adsorption thermodynamic
adsorption kinetics
