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阿霉素在钴离子注入修饰电极上的电化学行为及其应用 被引量:3

Electrochemical Behaviour of Adriamydn and Its Application at Co/GC Ion Implantation Modified Electrode
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摘要 阿霉素在0.1mol/L HAc-NaAc(pH 4.62)缓冲溶液中用注入钴的修饰玻碳电极为工作电极进行伏安测定,得到一良好的还原峰,E_p=-0.522V(vs.SCE).峰电流与阿霉素浓度在1.4×10^(-7)~1.4×10^(-6)mol/L和1.4×10^(-6)~5.6×10^(-5)mol/L范围内呈线性关系.检出限为5.0×10^(-8)mol/L.并用于尿样的测定,得到满意的结果.用线性扫描和循环伏安法研究了体系的电化学行为及电极反应机理.电极反应属准可逆过程.用AES和XPS等表面分析技术检测了注入电极表面的元素组成、价态和深度分布,对离子注入电极的催化性质进行探讨. With Co/GC ion implantation modified electrode as working electrode, in 0.1 mol/L HAc-NaAc(pH 4. 62) solution, a sensitive reductive peak of adriamycin was obtained by linear sweep voltammetry.The peak potential was-0.522 V( MS . SCE) . The peak current was proportional to theconcentration of adriamycin over the range of 1.4×10-7~1.4×10-6 mol/L and 1.4X10-6~5.6×10-5mol/L. The limit detection was 5.0×10-8 mol/L. The behaviour of the reduction peak was sutdiedand applied to the determination of adriamycin in urine. The reduction process was quasi-reversible. The element composition, atomicity form and depth distribution at the surface of Co/GC electrode were determined by Auger election spectrometry (AES) and X-ray photoelecrron spectrometry(XPS) . The catalysis behaviour at Co/GC ion implantation modified electrode was aslo studied.
出处 《分析化学》 SCIE EI CAS CSCD 北大核心 1999年第11期1280-1283,共4页 Chinese Journal of Analytical Chemistry
基金 国家自然科学基金(No.29875003) 高等学校博士学科点专项科学基金(No.98002709)资助项目
关键词 阿霉素 电化学行为 离子注入 修饰电极 测定 Adriamycin, electrochemical behaviour, ion implantation, modified electrode
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