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A novel complementary N^+-charge island SOI high voltage device

A novel complementary N^+-charge island SOI high voltage device
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摘要 A new complementary interface charge island structure of SOI high voltage device(CNI SOI) and its model are presented.CNI SOI is characterized by equidistant high concentration n+-regions on the top and bottom interfaces of dielectric buried layers.When a high voltage is applied to the device,complementary hole and electron islands are formed on the two n+-regions on the top and bottom interfaces.The introduced interface charges effectively increase the electric field of the dielectric buried layer(EI) and reduce the electric field of the silicon layer(ES),which result in a high breakdown voltage(BV).The influence of structure parameters and its physical mechanism on breakdown voltage are investigated for CNI SOI.EI=731 V/μm and BV=750 V are obtained by 2D simulation on a 1-μm-thick dielectric layer and 5-μm-thick top silicon layer.Moreover,enhanced field EI and reduced field ES by the accumulated interface charges reach 641.3 V/μm and 23.73 V/μm,respectively. A new complementary interface charge island structure of SOI high voltage device(CNI SOI) and its model are presented.CNI SOI is characterized by equidistant high concentration n+-regions on the top and bottom interfaces of dielectric buried layers.When a high voltage is applied to the device,complementary hole and electron islands are formed on the two n+-regions on the top and bottom interfaces.The introduced interface charges effectively increase the electric field of the dielectric buried layer(EI) and reduce the electric field of the silicon layer(ES),which result in a high breakdown voltage(BV).The influence of structure parameters and its physical mechanism on breakdown voltage are investigated for CNI SOI.EI=731 V/μm and BV=750 V are obtained by 2D simulation on a 1-μm-thick dielectric layer and 5-μm-thick top silicon layer.Moreover,enhanced field EI and reduced field ES by the accumulated interface charges reach 641.3 V/μm and 23.73 V/μm,respectively.
出处 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2010年第11期47-51,共5页 半导体学报(英文版)
基金 Project supported by the National Natural Science Foundation of China(Nos.60806025,60976060),the NKLAIC(No.9140C090 3070904) the Youth Teacher Foundation of University of Electronic Science and Technology of China(No.jx0721)
关键词 COMPLEMENT charge islands interface charges dielectric buried layer breakdown voltage complement; charge islands; interface charges; dielectric buried layer; breakdown voltage;
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参考文献15

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