摘要
利用自行研制的石英钟罩式微波等离子体化学气相沉积金刚石薄膜装置，研究了硅基片的不同预处理方式对沉积结果的影响。通过扫描电子显微镜形貌观察和喇曼谱分析表明，基片预处理能提高形核密度；用于预处理的金刚石研磨膏的粒度不同，影响金刚石薄膜沉积时的形核密度、晶形和薄膜的质量；表面划痕对沉积金刚石薄膜的影响具有双重性。
Diamond films were prepared on silicon substrate using a home made quartz bell jar type microwave plasma chemical vapor deposition device. Influence of different pre-treatment was investigated by scanning electron microscopy and Raman spectroscopy. The results showed that pre-treatment of substrates could enhance the nucleation density. The grain size of diamond abrasion paste significantly affected the nucleation density and the crystal morphology of the diamond films. The surface scratching on substrates may increase nucleation density but inversely affect the quality of the diamond films.
出处
《真空科学与技术》
CSCD
北大核心
1998年第4期313-316,共4页
Vacuum Science and Technology
基金
国家863计划资助
关键词
预处理
化学气相沉积
金刚石
薄膜
MWP
CVD
Pre-treatment, Microwave plasma chemical vapor deposition, Diamond film
