期刊文献+

非测量层SnK_α特征谱线对X射线荧光光谱法测定冷轧镀锡板Sn层质量影响的探讨 被引量:4

Study on the influence of SnK_α characteristic spectrum of non-measured layer on mass determination of cold-rolled tin plate by X-ray fluorescence spectrometry
下载PDF
导出
摘要 本文运用ZSX仪器分析软件建立了基本参数法(FP)测试模型,对冷轧镀锡板Sn层质量分析中非测量层SnKα特征谱线对定量分析的影响进行了研究。阐述了影响非测量层SnKα特征谱线产生的两大因素基板厚度和镀层质量及其变化对定量分析产生的SnKα增量影响程度,得出当基板厚度大于0.2 mm时,非测量层SnKα特征谱线产生的增量较小,可以进行相应的校正;当基板厚度小于0.2 mm时,非测量层SnKα特征谱线产生的Sn增量较大,且不易校准;当基板厚度一定并可导致非测量SnKα特征谱线产生时,此时由镀层质量变化而导致非测量SnKα特征谱线产生的Sn增量比较稳定,可进行相应的校正,并用实际生产样品进行了分析、验证。 The fundamental parameter (FP) method test model was established using ZSX instrumental analysis software in this study. The effect of SnKo characteristic lines in non-measurement layer on quantitative analysis of Sn-layer mass in cold-rolled tin plate was investigated. The influence of both factors affecting SnKα characteristics lines in non-measurement layer, substrate thickness and coating mass, on the SnKα increment caused in quantitative analysis is analyzed. It was found that when the substrate thickness was more than 0.2 mm, the increment caused by SnKα characteristic lines in non- measurement layer was relatively little, and the corresponding correction could be conducted; When the substrate thickness was less than 0.2mm, the increment caused by SnKα characteristic lines in non-measurement layer was relatively large and hardly corrected; When the substrate thickness was definite, which would generate non-measurement SnKα characteristic lines, the Sn increment caused by change of plating mass was relatively stable, and the corresponding correction could be conducted. The results were analyzed and verified bv actual product samples.
出处 《冶金分析》 CAS CSCD 北大核心 2010年第3期18-22,共5页 Metallurgical Analysis
关键词 X射线荧光光谱 基板厚度 镀层质量 非测量层 SnKα X-ray fluorescence spectrometry substrate thickness plating quality non-measurement layer SnKα
  • 相关文献

参考文献7

  • 1日本东洋钢板公司著..镀锡薄钢板[M].北京:冶金工业出版社,1977:302.
  • 2刘杨军,王玉琴,程新兰,崔步光,关宇,李福华,高新华.铝电解用预焙阳极中杂质元素的X射线荧光光谱法测定[J].科学技术与工程,2006,6(18):2976-2977. 被引量:5
  • 3韩小元,卓尚军,王佩玲.X射线荧光光谱法表征薄膜进展[J].光谱学与光谱分析,2006,26(1):159-165. 被引量:19
  • 4Martin E, Nordberg III. Theory and numerical modeling of X-ray fluorescence from multi-layer spheres [J]. X-Ray Spectrometry, 1991,20:245-254. 被引量:1
  • 5Huang T C. Thin-Film Characterization by X-Ray Fluorescence[J]. X-Ray Spectrometry , 1991,20 ( 1 ) 29-33. 被引量:1
  • 6梁钰编著..X射线荧光光谱分析基础[M].北京:科学出版社,2007:269.
  • 7吉昂等编著..X射线荧光光谱分析[M].北京:科学出版社,2003:295.

二级参考文献91

共引文献21

同被引文献36

引证文献4

二级引证文献15

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部