摘要
为了得到更好的蚀刻效果,有必要研究蚀刻液的稳定性,因而研究方法显得尤为重要。研究了3组各成分含量不同的蚀刻液的稳定性,通过原子发射光谱法测得蚀刻液中Ni2+浓度,并间接计算出腐蚀量,对比考察了根据蚀刻速率-腐蚀量的关系和蚀刻速率-时间的关系研究蚀刻液稳定性这2种方法。实验结果证明:根据蚀刻速率-腐蚀量的关系研究蚀刻液的稳定性具有可行性,且更具优越性;同时,3种蚀刻液中,1B42稳定性最好,且该蚀刻液的最大金属腐蚀量为3 g/L。
In order to improve the effect of etching, it needed to study the stability of etching solution, and its method of studying was more important. Obtained the concentration of Ni^2＋ by ICP-AES, then obtained the weight of etched metal, studied the stability of three types of solution with different concentration, found the relations between etching rate and etched weight, as well as etching rate and etching time, then compared the both of them. It shows that the relations between etching rate and etched weight had superiority and is viable for evaluating the stability of etching solution. Meanwhile, the stability of 11342 is the best, and the solution＇s maximum of etched metal is more than 3 g/L.
出处
《表面技术》
EI
CAS
CSCD
北大核心
2010年第1期91-92,96,共3页
Surface Technology
关键词
化学蚀刻
蚀刻液
稳定性
Chemic etching
Etching solution
Stability
