摘要
用硝酸和氢氟酸溶解试样,采用耐氢氟酸雾化装置,用ICP-AES法测定硅锰合金中的硅。选择的最佳仪器工作条件为:长波积分时间15s、短波积分时间15s、雾化气流量30L/min、分析泵速100mL/min、辅助气流量1.0L/min、射频功率950W、试样冲洗时间30s,分析谱线212.412nm,试样粒度应在88μm以下。方法RSD(n=10)为0.2526%,硅回收率99.03%～100.8%,操作简便,分析周期短,能满足硅锰合金中硅的测定要求。
Dissolving sample with nitric acid and hydrofluoric acid,the silicon content of silicon-manganese alloy was made a measurement with ICP-AES method in the hydrofluoric acid-resistant spray devices. Selected best equipment working conditions：high WL range 15 s,low WL range 15 s,flow rate of atomization gas 30 L/min,analysis pump rate 100 mL/min,assistant gas flow1.0 L/min,RF power 950 W and sample flush time 30 s. Selected analysis spectral line was 212.412 nm. The sample size should be below 88 μm.The relative standard deviation （n=lO） was 0.252 6% and the silicon recoveries were 99.03% - 100.8%. The method was simple, fast and can meet the requirements of determination of silicon in silicon-manganese alloy.
出处
《山东冶金》
CAS
2009年第5期140-141,共2页
Shandong Metallurgy
关键词
电感耦合等离子体发射光谱法
硅锰合金
硅
inductively coupled plasma emission spectroscopy
silicon-manganese alloy
silicon
