摘要
研究了采用HF和HNO3非择优腐蚀多晶硅表面制备绒面的机理。通过实验分析了酸混合液的体积浓度配比、添加剂、温度和时间等因素对腐蚀速率和腐蚀后表面形貌的影响;总结出了多晶Si的酸腐蚀规律,得到了制备理想绒面的酸混合液体积配比(V(HF):V(HNO3):V(CH3COOH)=1∶12∶6)。在此基础上提出了优化设计方案:采用廉价的水代替醋酸作为缓蚀剂,腐蚀过程置于超声槽中进行,利用超声波的振动使反应生成的气泡快速脱离多晶Si片表面,同时使腐蚀液浓度分布更加均匀,从而制备出效果更佳的多晶Si绒面。
The basic principles of multi-crystalline isotropic etch to get textured surface using the compound of hydrofluoric acid and nitric acid were studied. The influence factors of Mc-Si etch rate and textured surface conditions were analyzed through experiment, such as mixture ratio of acid compound, additives, etching temperature and time. Some rules of Mc-Si etch were found out, and better textured surface was obtained when the concentration ratio of hydrofluoric acid, nitric acid and acetic acid is 1 ： 12 ： 6. On this basis, an optimized design scheme for etching Mc- Si to get textured surface was introduced. Mc-Si was etched in the ultrasonic tank with water as inhibitor instead of acetic acid, the bubble was accelerated to desorb from the Mc-Si surface by ultrasonic vibration and the corrosive liquid concentration was made well-distributed, thus a better Mc-Si textured surface was obtained.
出处
《微纳电子技术》
CAS
北大核心
2009年第10期627-631,共5页
Micronanoelectronic Technology
关键词
多晶硅太阳电池
酸腐蚀
表面形貌
腐蚀速率
多晶硅片制绒
multi-crystalline silicon solar cells
acid etch
textured surface
etch rate
multicrystalline silicon texturization
