摘要
在不同氧分压条件下对WO3粉末靶进行磁控溅射,在ITO导电玻璃基底上沉积得到WO3薄膜。分析发现,当氧分压O2∶Ar为1∶10的时,WO3薄膜的显微组织均匀细密,薄膜原态的透光率可达88%。将WO3薄膜作为不同电极在LiClO4溶液中进行电色反应,发现着色态透光率在紫光区可达41%,在整个红外区透光率最高不过25%;而漂白态在紫光区可达85%,在整个红外区透光率在82%左右。采用XPS光电子能谱研究了WO3薄膜的电致变色机理,发现遵循典型的双离子注入模型。
A series of WO3 films are prepared on ITO conductive thin film by magnetron sputtering under different partial pressures of oxygen. It is found that the films with oxygen partial pressure ratio 1：10 present fine uniform microstructure. The transmittance of original-state film is up to 88 %. WO3 thin film react in LiCIO4 solution. The transmittance of color-state is up to 41% in ultraviolet region, the highest transmittance in the infrared region is no more than 25%. At the same time, the transmittance of bleached-state is up to 85% in ultraviolet region, the transmittance in the infrared region is about 82%. Electrochromic mechanism of WO3 thin film is studied using photoelectron spectroscopy XPS. It follows the law of typical dual ion implantation model.
出处
《铸造技术》
CAS
北大核心
2009年第9期1153-1156,共4页
Foundry Technology
关键词
磁控溅射
WO3薄膜
电致变色
透光率
XPS谱
Magnetron sputtering
WO3 thin film
Electrochromic
Transmittance
XPS spectrum
