摘要
从容易制得的两种单体合成了结构型感光聚酰亚胺（ＰＳＰＩ），该聚合物在极性溶剂中有良好的溶解性，在中紫外至深紫外区具有负性感光性，其分辩率小于３μｍ，固化时膜无收缩、变形和减薄等现象。还采用ＩＲ谱对其感光机理进行了初步的研究。
A new type photosensitive polyimide(PSPI) was prepared using benzophenone 3,3′,4,4′ tetracarboxylic acid dianhydride and 3,3′ dimethyl, 4,4′ diaminodiphenyl methane as monomers followed by chemical imidization. This polymer possesses good solubility in polar solvents and negative photosensitivity in middle UV to deep UV range. The photo etching structure has a resolution greater than 3 μm and no film shrinkage, deformation and thinning were observed during the curing process. The mechanism of its photosensitivity was preliminarily studied.
出处
《高分子材料科学与工程》
EI
CAS
CSCD
北大核心
1998年第5期96-98,共3页
Polymer Materials Science & Engineering
关键词
聚酰亚胺
感光树脂
结构型
polyimide, photosensitive resin, 3,3′ dimethyl, 4,4′ diamino diphenyl methane
