摘要
利用离子束增强沉积（ＩＢＥＤ）技术制备了Ｃｒ－Ｎ薄膜，并对不同能量氮离子轰击所制备的薄膜组成进行了Ｘ射线衍射及光电子能谱分析，测定了涂层的断裂韧性值，并对涂层的摩擦学性能进行了研究．结果表明：在相同试验条件下，氮离子轰击能量影响Ｃｒ－Ｎ薄膜的相组成及取向，采用低能量氮离子轰击所得到的薄膜具有较高的断裂韧性和优异的耐磨性能．
Cr N films were synthesized with 4, 8 and 12keV nitrogen ion bombarding with 0.5 μA/mm 2 by IBED. The structure of the films was characterized by X ray diffraction (XRD) and X ray photoelectron spectroscopy (XPS), where as the friction and wear properties of the films were investigated on a ball on disc tester. Results indicate that the phases and orientation of Cr N were affected obviously by nitrogen ion bombarding energy, and films with lower energy had better tribological property and higher fracture toughnes, especially for 4 keV.
出处
《摩擦学学报》
EI
CAS
CSCD
北大核心
1998年第2期113-118,共6页
Tribology
基金
国家自然科学基金
